Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element
Reexamination Certificate
2007-07-17
2007-07-17
Nguyen, Ha Tran (Department: 2829)
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
Of individual circuit component or element
C216S061000
Reexamination Certificate
active
10985808
ABSTRACT:
An integrated FIB/PEM apparatus and method for performing failure analysis on integrated circuits. In-situ failure analysis is enabled by integrating Photon Emission Microscopy into a Focused Ion Beam system, thereby improving throughput and efficiency of Failure Analysis. An iterative method is described for identifying and localizing fault sites on the circuit.
REFERENCES:
patent: 5091692 (1992-02-01), Ohno et al.
patent: 5358806 (1994-10-01), Haraichi et al.
patent: 5541411 (1996-07-01), Lindquist et al.
patent: 5574280 (1996-11-01), Fujii et al.
patent: 5844416 (1998-12-01), Campbell et al.
patent: 5892539 (1999-04-01), Colvin
patent: 5905266 (1999-05-01), Larduinat et al.
patent: 5986264 (1999-11-01), Grunewald
patent: 6043882 (2000-03-01), De Wolf
patent: 6112004 (2000-08-01), Colvin
patent: 6121616 (2000-09-01), Trigg
patent: 6252412 (2001-06-01), Talbot et al.
patent: 2003/0046024 (2003-03-01), Duncan et al.
patent: 2003/0102436 (2003-06-01), Benas-Sayag
Delenia Eugene
Tsao Chun-Cheng
Credence Systems Corporation
Velez Roberto
Wenocur Deborah
LandOfFree
Integration of photon emission microscope and focused ion beam does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Integration of photon emission microscope and focused ion beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integration of photon emission microscope and focused ion beam will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3778727