Integrated thin-film solar cells and method of manufacturing...

Etching a substrate: processes – Forming or treating optical article

Reexamination Certificate

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Details

C136S252000, C257SE27125, C257SE31126, C438S061000

Reexamination Certificate

active

07927497

ABSTRACT:
The present invention relates to integrated thin film solar cells, and more particularly, to integrated thin film solar cells, which minimize the loss of integrated solar cells caused at the time of a manufacturing process and become available at a low cost process, and a method of manufacturing thereof, a processing method of a transparent electrode for integrated thin film solar cells, which widens an effective area and reduces manufacturing costs by minimizing a (insulating) gap between unit cells of the integrated thin film solar cells, and a structure thereof, and a transparent substrate having the transparent electrode. The method of manufacturing integrated thin film solar cells, comprising the steps of: (a) forming a transparent electrode pattern separately over a transparent substrate; (b) forming a solar cell (semiconductor) layer over the substrate of the step (a); (c) forming a first back electrode by obliquely depositing a conductive material over the solar cell (semiconductor) layer; (d) etching the solar cell (semiconductor) layer by using the first back electrode as a mask; and (e) forming a second back electrode so that the transparent electrode and the first back electrode are electrically connected by obliquely depositing a metal over the substrate of the step (d).

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