Integrated thin film explosive micro-detonator

Details Integrated thin film explosive micro-detonator Integrated thin film explosive micro-detonator

2003-12-03

2009-10-06

Lorengo, Jerry (Department: 1793)

Ammunition and explosives

Igniting devices and systems

Electrical primer or ignitor

C102S205000, C102S275110, C149S109600

Reexamination Certificate

active

07597046

ABSTRACT:
A method of making a thin film explosive detonator includes forming a substrate layer; depositing a metal layer in situ on the substrate layer; and reacting the metal layer to form a primary explosive layer. The method and apparatus formed thereby integrates fabrication of a micro-detonator in a monolithic MEMS structure using “in-situ” production of the explosive material within the apparatus, in sizes with linear dimensions below about 1 mm. The method is applicable to high-volume low-cost manufacturing of MEMS safety-and-arming devices. The apparatus can be initiated either electrically or mechanically at either a single point or multiple points, using energies of less than about 1 mJ.

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