Integrated thin film explosive micro-detonator

Details Integrated thin film explosive micro-detonator Integrated thin film explosive micro-detonator

2008-01-29

2008-01-29

Johnson, Stephen M (Department: 3641)

Ammunition and explosives

Igniting devices and systems

Arming devices

C102S275110

Reexamination Certificate

active

07322294

ABSTRACT:
A method of making a thin film explosive detonator includes forming a substrate layer; depositing a metal layer in situ on the substrate layer; and reacting the metal layer to form a primary explosive layer. The method and apparatus formed thereby integrates fabrication of a micro-detonator in a monolithic MEMS structure using “in-situ” production of the explosive material within the apparatus, in sizes with linear dimensions below about 1 mm. The method is applicable to high-volume low-cost manufacturing of MEMS safety-and-arming devices. The apparatus can be initiated either electrically or mechanically at either a single point or multiple points, using energies of less than about 1 mJ.

REFERENCES:
patent: 2296901 (1942-09-01), Brayton
patent: 2705921 (1955-04-01), Moseman, Jr.
patent: 3380385 (1968-04-01), Hazelet
patent: 4862803 (1989-09-01), Nerheim et al.
patent: 5370053 (1994-12-01), Williams et al.
patent: 6173650 (2001-01-01), Garvick et al.
patent: 6178888 (2001-01-01), Neyer et al.
patent: 6386108 (2002-05-01), Brooks et al.

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