Integrated thermal unit having a shuttle with two-axis movement

Details Integrated thermal unit having a shuttle with two-axis movement Integrated thermal unit having a shuttle with two-axis movement

2007-11-20

2007-11-20

Paik, Sang (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C118S724000

Reexamination Certificate

active

11174781

ABSTRACT:
An integrated thermal unit comprises a bake station comprising a bake plate configured to hold and heat a substrate; a chill station comprising a chill plate configured to hold and cool a substrate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the chill plate along a horizontally linear path within the thermal unit and raise and lower substrates along a vertical path within the integrated thermal unit.

REFERENCES:
patent: 4718975 (1988-01-01), Bowling et al.
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5651823 (1997-07-01), Parodi et al.
patent: 6467976 (2002-10-01), Matsuyama et al.
patent: 6499777 (2002-12-01), Wang
patent: 6515731 (2003-02-01), Akimoto
patent: 6639189 (2003-10-01), Ramanan et al.
patent: 6814507 (2004-11-01), Inagaki
Office Action for U.S. Appl. No. 11/174,988, filed Sep. 11, 2006.
Office Action for U.S. Appl. No. 11/174,782, filed Sep. 11, 2006.

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