Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-11-25
1990-02-06
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 2041828, 2041833, G01N 2726
Patent
active
048986585
ABSTRACT:
An integrated temperature control/alignment system for use with a high performance capillary electrophoretic apparatus is disclosed. In one exemplary embodiment the integrated temperature control/alignment system comprises a pair of capillary column mounting plates for mounting a capillary column as a constituent of the electrophoretic apparatus, a pair of secondary support plates, a pair of thermoelectric plates and external heat sink plates. Detection openings are formed in each of the plates as required so that a continuous detection path exists through the integrated temperature control/alignment system. The capillary column is seated and locked in grooves formed in the capillary column mounting plates so that the detection windows of the capillary column are coordinated with the aligned detection openings formed in the applicable plates of the integrated temperature control/alignment system. The temperature of substantially the entire capillary column, including the detection zone, is controlled or regulated by the temperatures of the thermoelectric plates which comprise one or more thermoelectric circuits utilizing the Peltier effect. Regulation of current flow in the thermoelectric plates controls the temperature effect exerted by the thermoelectric plates, thereby controlling both the direction and rate of heat transfer with the capillary column.
REFERENCES:
patent: 3677930 (1972-07-01), Meshbane et al.
patent: 3948753 (1976-04-01), Arlinger
patent: 4624768 (1986-11-01), Yoshida et al.
patent: 4675300 (1987-06-01), Zare et al.
Cohen Aharon S.
Karger Barry L.
Nelson Robert J.
Paulus Aran
Niebling John F.
Northeastern University
Starsiak Jr. John S.
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