Integrated semiconductor optical device and optical...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction

Reexamination Certificate

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C257S106000, C257SE29341, C257SE33027, C372S044010

Reexamination Certificate

active

08063408

ABSTRACT:
In an integrated semiconductor optical device, a first cladding layer is made of a first conductivity type semiconductor. A first active layer for forming a first semiconductor optical device is provided on the first cladding layer in a first area of a principal surface of a substrate. A second active layer for forming a second semiconductor optical device is provided on the first cladding layer in a second area of the principal surface. A second cladding layer made of a second conductivity type semiconductor is provided on the second active layer. A third cladding layer made of a first conductivity type semiconductor is provided on the first active layer. A tunnel junction region is provided between the first active layer and the third cladding layer. The first active layer is coupled to the second active layer by butt joint. The second and third cladding layers form a p-n junction.

REFERENCES:
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patent: 2006/0205104 (2006-09-01), Murata
patent: 64-28984 (1989-01-01), None
patent: 8-335745 (1996-12-01), None
patent: 2000-501238 (2000-02-01), None
Nishiyama et al., “High efficiency long wavelength VCSEL on InP grown by MOCVD”, Electronics Letters, Mar. 6, 2003, vol. 39, No. 5, pp. 437-439.
Ortsiefer et al., “Low-resistance InGa(AI)As Tunnel Junctions for Long Wavelength Vertical-cavity Surface-emitting Lasers”, Jpn. J. Appl. Phys., vol. 39, (2000), pp. 1727-1729.

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