Electric lamp and discharge devices: systems – With electromagnetic wave radiation preventing or shielding...
Reexamination Certificate
2006-08-08
2006-08-08
Tran, Thuy Vinh (Department: 2821)
Electric lamp and discharge devices: systems
With electromagnetic wave radiation preventing or shielding...
C361S816000
Reexamination Certificate
active
07088046
ABSTRACT:
A plasma reactor sub-assembly includes both an electrostatic shield and a process tube. Optionally, the electrostatic shield and the process tube are connected. Alternatively, they are configured to fit together without being physically connected. The sub-assembly may be manufactured using a process tube nested within the circumference of an electrostatic shield, an electrostatic shield patterned directly on a process tube using, for example, thin film deposition, or a process tube bonded or not bonded to an electrostatic shield made of a flexible, electrical film material.
REFERENCES:
patent: 5571366 (1996-11-01), Ishii et al.
patent: 5647913 (1997-07-01), Blalock
patent: 6385977 (2002-05-01), Johnson
patent: 6511577 (2003-01-01), Johnson
patent: 6630364 (2003-10-01), Johnson
patent: 6758948 (2004-07-01), Johnson
patent: 2002/0125223 (2002-09-01), Johnson et al.
Pillsbury Winthrop Shaw & Pittman LLP
Tokyo Electron Limited
Tran Thuy Vinh
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