Integrated photonic crystal structure and method of...

Optical waveguides – Planar optical waveguide

Reexamination Certificate

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C385S043000, C385S130000, C385S131000

Reexamination Certificate

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10492644

ABSTRACT:
An integrated photonic crystal (IPC) structure and method of producing the same in which the IPC structure includes a first layered sub-structure with a surface and a one-dimensional periodic refractive index variation along the direction perpendicular to the surface, and a second sub-structure with a plurality of essentially straight identical passages arranged in a two-dimensional periodic pattern cutting through the layered structure at an angle α. First and second defects in the first and second sub-structures, respectively, enable electromagnetic modes to be localized in the vicinity of the defects and allow photonic crystal waveguide to be constructed that can control and filter light very efficiently and minimize radiation losses.

REFERENCES:
patent: 5172267 (1992-12-01), Yablonovitch
patent: 5440421 (1995-08-01), Fan et al.
patent: 5608753 (1997-03-01), Paoli et al.
patent: 5784400 (1998-07-01), Joannopoulos et al.
patent: 5955749 (1999-09-01), Joannopoulos et al.
patent: 6130780 (2000-10-01), Joannopoulos et al.
patent: 6134043 (2000-10-01), Johnson et al.
patent: 6261469 (2001-07-01), Zakhidov et al.
patent: 6310991 (2001-10-01), Koops et al.
patent: 6380551 (2002-04-01), Abe et al.
patent: 6469682 (2002-10-01), de Maagt et al.
patent: 2005/0167648 (2005-08-01), Chang-Hasnain et al.
patent: 0 953 853 (1999-11-01), None
patent: 1 052 529 (2000-11-01), None
patent: WO 00/22466 (2000-04-01), None
Hanaizumi O., et al, “Propagation of light Beams Along Line Defects Form in A-SI/SI02 Three-Dimensional Photonic Crystals: Fabrication and Observation”, Applied Physics Letters, American Institute of Physics, New York, vol. 74, No. 6, pp. 777-779, Feb. 1999. (Abstract Only).
Kuramochi E., et al, “A New Fabrication Technique for Photonic Crystals: Nanolithography Combined with Alternating-Layer Deposition”, Optical and Quantum Electronics, Chapman and Hall, pp. 53, Jan. 2002. (Abstract Only).

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