Electrical resistors – Resistance value responsive to a condition – Magnetic field or compass
Patent
1993-12-03
1996-01-23
Hoang, Tu
Electrical resistors
Resistance value responsive to a condition
Magnetic field or compass
338 32H, 323368, H01L 4300
Patent
active
054868041
ABSTRACT:
A magnetoresistor is monolithically integrated with an active circuit by growing a thin film magnetoresistor on a semiconductor substrate after the substrate has been doped and annealed for the active devices. The magnetoresistor is grown through a window in a mask, with the mask and magnetoresistor materials selected such that the magnetoresistor is substantially non-adherent to the mask. InSb is preferred for the magnetoresistor, Si.sub.3 N.sub.4 for the mask and GaAs for the substrate. The non-adherence allows the mask to be substantially thinner than the magnetoresistor without impairing the removal of the mask after the magnetoresistor has been established.
REFERENCES:
patent: 3852103 (1974-12-01), Collins et al.
patent: 3898359 (1975-08-01), Nadkarni
patent: 4296424 (1981-10-01), Shibasaki et al.
patent: 4401966 (1983-08-01), Ohmura et al.
patent: 4573257 (1986-03-01), Hulseweh
patent: 4681657 (1987-07-01), Hwang et al.
patent: 4707455 (1987-11-01), Tsang et al.
patent: 4978938 (1990-12-01), Partin et al.
patent: 5038130 (1991-08-01), Eck et al.
J. Electrochem. Society; Solid-State Science and Technology, Oct. 1984, "Growth of InSb and InAs.sub.1 -x SB.sub.x by OM-CVS", by P. K. Chiang and S. M. Bedair.
IEEE Electron Device Letters, vol. EDL-7, No. 4, Apr. 1986, "A GaAs Integrated Hall Sensor Amplifier" by T. R. Lepkowski, G. Shade, S. P. Kwok, Milton Feng, Lawrence E. Dickens, D. L. Laude, B. Schoendube.
MRL Bull, Res. Dev. vol. 2, No. 2 (1988), "Semiconductive Magnetoresistors" C. W. Wang, S. Yeh, M. T. Chu and S. H. Lee.
Sokolich Marko
Yamasaki Hiroyuki
Yang Huai-Tung
Denson-Low W. K.
Hoang Tu
Hughes Aircraft Company
Lachman M. E.
Sales M. W.
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