Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2007-04-03
2007-04-03
Pham, Thanhha (Department: 2813)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C257S760000, C257S774000
Reexamination Certificate
active
11028884
ABSTRACT:
Embodiments of the invention provide a device with a hard mask layer between first and second ILD layers. The hard mask layer may have a k value approximately equal to the first and/or second ILD layers.
REFERENCES:
patent: 5946601 (1999-08-01), Wong et al.
patent: 6261726 (2001-07-01), Brooks et al.
patent: 6291887 (2001-09-01), Wang et al.
patent: 6489233 (2002-12-01), Chooi et al.
patent: 2001/0006848 (2001-07-01), Allada et al.
patent: 2002/0090806 (2002-07-01), Ahn et al.
patent: 2003/0075803 (2003-04-01), Gates et al.
patent: 2003/0113995 (2003-06-01), Xia et al.
patent: 2003/0134495 (2003-07-01), Gates et al.
patent: 2004/0021196 (2004-02-01), Brennan et al.
patent: 2004/0094839 (2004-05-01), Fitzsimmons et al.
patent: 2004/0119163 (2004-06-01), Wong et al.
patent: 2002 093747 (2002-03-01), None
M. Aono et al., “Dielectric Properties of Amorphous Carbon Nitride Films”, Mat. Res. Soc. Symp. Proc. vol. 593, 2000 Materials Research Society, pp. 493-498.
M. Aono, et al., “Amorphous Carbon Nitride Films As A Candidate For Low Dielectric Constant Materials”, Mat. Res. Soc. Symp. Proc. vol. 565, 1999 Materials Research Society, pp. 291-296.
H. Ohtake et al., “Cu Dual Damascene Interconnects With In-Situ Fluorinated Carbon-Nitride (FCN:-C=N(F)-) Barrier Layers In Low-K Organic Film”, 2002 IEEE, pp. 599-602.
King Sean W.
Ott Andrew W.
Intel Corporation
Pham Thanhha
Plimier Micheal D.
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