Integrated lithographic fabrication cluster

Details Integrated lithographic fabrication cluster Integrated lithographic fabrication cluster

2007-09-25

2007-09-25

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With developing

C355S053000, C355S077000, C396S611000, C414S935000, C430S311000

Reexamination Certificate

active

10731430

ABSTRACT:
An integrated lithographic fabrication cluster system, as presented herein, comprises an exposure apparatus to expose a pattern onto a substrate with an associated exposure controller to control the exposure apparatus and a track apparatus interconnecting a plurality of processing modules with an associated track controller to control the track apparatus. The cluster system also comprises a wafer handling apparatus coupled to the exposure apparatus and track apparatus that is configured to transfer substrates between the processing modules utilized by the exposure apparatus and track apparatus and a wafer handling controller to control the wafer handling apparatus. The cluster system further comprises a cluster controller that communicates control information to at least one of the exposure controller, the track controller, and the wafer handling controller to manage operations of the exposure apparatus, the track apparatus, and the wafer handling apparatus during the lithographic fabrication process.

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