Integrated inspection system and defect correction method

Semiconductor device manufacturing: process – With measuring or testing

Reexamination Certificate

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Reexamination Certificate

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07371590

ABSTRACT:
A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.

REFERENCES:
patent: 4938601 (1990-07-01), Weber
patent: 5798829 (1998-08-01), Vaez-Iravani
patent: 6379868 (2002-04-01), White
patent: 6768543 (2004-07-01), Aiyer
patent: 6922236 (2005-07-01), Vaez-Iravani et al.
patent: 2001/0013936 (2001-08-01), Nielsen et al.
patent: 2002/0093648 (2002-07-01), Nikoonahad et al.
patent: 2002/0114084 (2002-08-01), Summersgill et al.
patent: 2003/0011760 (2003-01-01), Vaez-Iravani et al.
patent: 2003/0156280 (2003-08-01), Reinhorn
patent: 2003/0227618 (2003-12-01), Some
patent: 2004/0145734 (2004-07-01), Shibata et al.
patent: 2006/0065645 (2006-03-01), Nakasu et al.
patent: 2006/0066845 (2006-03-01), Capaldo et al.
U.S. Appl. No. 11/285,332, filed Nov. 21, 2005, Harding et al., System and Method for Inspection of Films (Copy enclosed).
U.S. Appl. No. 11/285,329, filed Nov. 21, 2005, Capaldo et al., Method for Examining Molds and Apparatus for Accomplishing the Same (available in IFW).
U.S. Appl. No. 11/285,330, filed Nov. 21, 2005, Cheverton et al., Method for Detecting the Alignment of Films for Automated Defect Detection (available in IFW).
U.S. Appl. No. 11/285,137, filed Nov. 21, 2005, Yamada et al., Methods for Improving Mold Quality for Use in the Manufacture of Liquid Display Components (available in IFW).

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