Integrated gas control device

Fluid handling – Convertible – Units interchangeable between alternate locations

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

137884, F16K 5100

Patent

active

060124792

ABSTRACT:
The present invention relates to an integrated gas control device in a high purity gas supply system for a semiconductor manufacturing apparatus in which a gas control line is made compact and gas control units are easily mounted or removed and a flow passage can be flexibly designed and a total lead time for manufacturing can be made shorter and parts can be easily replaced for changing the flow passage by using the standardized constitution parts. In the integrated gas control unit, the adjacent passage blocks are connected to each other with a metal gasket inserted therebetween such that a gas flowing-out passage communicates with the gas flowing-in passage and are mounted on a base plate along many gas supply control lines arranged in parallel. The body of the desired gas control unit such as an automatic diaphragm valve or the like which is constituted longitudinally is inserted into the mounting hole of each passage block with a gasket inserted therebetween. The gas control unit is removably connected to the passage block by screwing a connecting cylinder fitted on the body on the passage block.

REFERENCES:
patent: 4977916 (1990-12-01), Ohmi et al.
patent: 5447173 (1995-09-01), Kazama et al.
patent: 5642756 (1997-07-01), Lawrence et al.
patent: 5819782 (1998-10-01), Itafuji

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Integrated gas control device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated gas control device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated gas control device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1455048

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.