Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly
Reexamination Certificate
2001-06-14
2004-07-06
Patel, Vip (Department: 2879)
Electric lamp or space discharge component or device manufacturi
Process
With assembly or disassembly
C430S312000
Reexamination Certificate
active
06758711
ABSTRACT:
BACKGROUND OF THE INVENTION
The present invention relates to the fabrication of lens design for electron emitters, particularly those electron emitters used in mass storage and display devices often incorporated in many electronic devices.
Computing technology continues to become less expensive while providing more capability. To allow computing technology to continue these positive trends, peripheral devices such as mass storage devices and display devices must continue to advance. Much criticism has been voiced in the trade press about the lack of mass storage devices such as disk drives, CD-ROMs, and DVD drives, to name a few, to increase their data rates up with the advancing speed of the microprocessors found in contemporary personal computers. However, hard disk drives, for example have been able to increase their storage density tremendously over the last decade but are now encountering physical limitations that prevents further progress in this area. Display devices, such as LCD monitors have had difficulty in fulfilling demand due to the complexity of manufacturing them with near-zero defects. Further, the use of passive LCD technology has required the addition of backlights to allow for viewing in different ambient light conditions thereby adding cost and increasing power requirements.
Electron beam technology has been present for many years in consumer products such as television (TV) tubes and computer monitors. These devices use what is known as “hot cathode” electrodes to create a source of electrons that are directed to and focused on the viewing screen. While research has taken place in a number of new technological fields with emission devices, the field of “cold cathode” electron emitters such as Spindt-tips and flat emitters has attracted the attention of many manufacturers.
Several problems exist in converting this cold cathode technology to products. One such problem is the creation of an electron focusing structure that can be used in multiple applications that require a high density of cold cathode emitting devices such as with mass storage and display devices. Conventionally, dielectric materials are used as spacer material between the electron focusing structure and the electron emitter. However, the cost and complexity of building the electron focusing structure with dielectric material hinders the rapid development of new products using cold cathode technology. In order to further the introduction of new products using cold cathode technology, more cost effective and simpler processes for building electron focusing structures and ultimately the mass storage and display devices are needed.
SUMMARY OF THE INVENTION
A method for creating an electron lens includes the steps of applying a polymer layer on an emitter surface of an electron emitter and then curing the polymer layer to reduce volatile content.
REFERENCES:
patent: 4923421 (1990-05-01), Brodie et al.
patent: 5090932 (1992-02-01), Dieumegard et al.
patent: 5232549 (1993-08-01), Cathey et al.
patent: 5413513 (1995-05-01), Horne et al.
patent: 5528103 (1996-06-01), Spindt et al.
patent: 5541473 (1996-07-01), Duboc, Jr. et al.
patent: 5557596 (1996-09-01), Gibson et al.
patent: 5658832 (1997-08-01), Bernhardt et al.
patent: 5877594 (1999-03-01), Miyano et al.
patent: 6008576 (1999-12-01), Nakatani et al.
patent: 6096570 (2000-08-01), Hattori
patent: 6137213 (2000-10-01), Moyer et al.
patent: 6137272 (2000-10-01), Liu et al.
patent: 6153978 (2000-11-01), Okamoto
patent: 0 289 278 (1988-11-01), None
patent: 0 559 156 (1993-09-01), None
Lee, Jin Ho, et al. “Fabrication and characterization of silicon field emitter arrays with focusing electrode by the chemical mechanical polishing process.” J. Vac. Sci. Technol. B 16(2) Mar./Apr. 1998, 811-814.
Endo, Yasuhiro, et al. “Microelectron gun with silicon field emitter,” J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, 3082-3085.
Itoh, Junji, et al. “Fabrication of double-gated Si field emitter arrays for focused electron beam generation,” J. Vac. Sci. Technol. B 13(5), Sep./Oct. 1995, 1968-1972.
Chen Zhizhang
Enck Ronald L.
Liu Qin
Ramamoorthi Sriram
Myers Timothy F.
Patel Vip
Zimmerman Glenn
LandOfFree
Integrated focusing emitter does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Integrated focusing emitter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated focusing emitter will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3233467