Patent
1987-08-07
1988-05-17
Davie, James W.
357 30, 357 40, 357 41, 357 54, H01L 2978, H01L 2702, H01L 2934
Patent
active
047454490
ABSTRACT:
High gain MESFETs, integratable with a photodetector for optical communications, result from a specific gate structure. In particular, a dielectric region, such as an undoped indium aluminum arsenide region overlaid by a thin aluminum oxide region, is employed. This gate combination with, for example, an n-type indium gallium arsenide active channel yields transconductances as high as 130 mS/mm.
REFERENCES:
patent: 4042945 (1977-06-01), Lin et al.
patent: 4442445 (1984-04-01), Malik et al.
Liao et al., An In.sub.0.53 Ga.sub.0.47 As/Si.sub.3 N.sub.4 n-Channel Inversion Mode MISFET", IEEE Electron Device Letters, vol. EDL-2, No. 11, Nov. 1981, pp. 288-290.
Barnard et al., "Double Heterostructure Ga.sub.0.47 In.sub.0.53 As MESFETs with Submicron Gates", IEEE Electron Device Letters, vol. EDL-1, No. 9, Sep. 1980, pp. 174-176.
Chang Tao-Yuasn
Howard Richard E.
American Telephone and Telegraph Company AT&T Bell Laboratories
Davie James W.
Epps Georgia Y.
Schneider Bruce S.
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