Integrated deflectors for beam alignment and blanking in...

Details Integrated deflectors for beam alignment and blanking in... Integrated deflectors for beam alignment and blanking in...

2011-08-23

2011-08-23

Vanore, David A (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S397000, C250S398000, C250S491100, C250S492100, C250S492200, C250S492220

Reexamination Certificate

active

08003952

ABSTRACT:
A charged particle beam column package includes an assembly (e.g., comprising a plurality of layers, which can have a component coupled to one of the layers), and at least one deflector between an extractor and aperture of the assembly. Further, at least one of the layers has interconnects thereon.

REFERENCES:
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patent: 5155412 (1992-10-01), Chang et al.
patent: 5585629 (1996-12-01), Doran et al.
patent: 6130429 (2000-10-01), Ambe et al.
patent: 6288401 (2001-09-01), Chang et al.
patent: 7109486 (2006-09-01), Spallas et al.
patent: 7394071 (2008-07-01), Kim et al.
patent: 2006/004374 (2006-01-01), None
L.P. Muray et al. “Advances in Arrayed Microcolumn Lithography,” J. Vac. Sci. Technol. B, vol. 18, No. 6, Nov./Dec. 2000.
T.H.P. Chang et al. “Multiple Electron-Beam Lithography,” Microelectronic Engineering 57-58 (2001) pp. 117-135.

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