Integrated circuit with upstanding stylus

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

Reexamination Certificate

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Details

C257SE21215

Reexamination Certificate

active

07928012

ABSTRACT:
A stylus, an integrated circuit (IC) and method of forming the IC. The stylus extends upward from its apex and has a substantially circular cross section that decreases in diameter upward from the apex. The stylus is formed in a mold that may be formed in an orifice in a dielectric layer between wiring layers. The mold may include multiple concentric layers. For a more pronounced, non-linear stylus taper, each layer may be thinner than its next adjacent outer concentric layer.

REFERENCES:
patent: 5920788 (1999-07-01), Reinberg
patent: 6507061 (2003-01-01), Klersy et al.
patent: 6586761 (2003-07-01), Lowrey
patent: 6908812 (2005-06-01), Lowrey
patent: 6937507 (2005-08-01), Chen
patent: 6985377 (2006-01-01), Rust
patent: 7012273 (2006-03-01), Chen
patent: 7271440 (2007-09-01), Harshfield
patent: 7319057 (2008-01-01), Lowrey

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