Integrated circuit with inductor having horizontal magnetic...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S381000, C438S622000

Reexamination Certificate

active

07384801

ABSTRACT:
An integrated circuit (IC) includes one or more inductors that have magnetic flux lines substantially parallel to a generally horizontal plane of the IC. The inductor is formed in a plurality of conductor layers separated by insulating layers of the IC. Regions of highest magnetic flux density of the inductor may preferably be located near the edge of the IC. Additionally, the inductor may preferably be segmented. The over-all inductance may preferably be controlled by turning on and off selected inductors or inductor segments.

REFERENCES:
patent: 5793272 (1998-08-01), Burghartz et al.
patent: 6291872 (2001-09-01), Wang et al.
patent: 6925701 (2005-08-01), Eckstein et al.
patent: 7253497 (2007-08-01), Bhatt et al.
Marc T. Thompson, Inductance Calculation Techniques—Part II: Approximations and Handbook Methods, “Power Control and Intelligent Motion,” Dec. 1999, website http://www.pcim.com, http://members.aol.com/Marcttpapers2/Induct2.pdf.
Steve Moshier, Calculation of electrical inductance—COIL02 Electrical Inductance Calculator, Jan. 2002, http://www.moshier.net/coildoc.html.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Integrated circuit with inductor having horizontal magnetic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated circuit with inductor having horizontal magnetic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated circuit with inductor having horizontal magnetic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2810170

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.