Integrated circuit system employing multiple exposure dummy...

Details Integrated circuit system employing multiple exposure dummy... Integrated circuit system employing multiple exposure dummy...

2011-08-23

2011-08-23

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Effecting frontal radiation modification during exposure,...

C430S311000, C430S394000

Reexamination Certificate

active

08003311

ABSTRACT:
An integrated circuit system that includes: providing a substrate coated with a photoresist material; exposing the photoresist material to an energy source through a first mask to form a first substrate feature and a second substrate feature therein; and exposing the photoresist material to the energy source through a second mask to transform the second substrate feature into another one of the first substrate feature therein.

REFERENCES:
patent: 5532090 (1996-07-01), Borodovsky
patent: 5811222 (1998-09-01), Gardner et al.
patent: 2005/0089765 (2005-04-01), Tsai et al.

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