Integrated circuit structure having semiconductor resistance reg

Metal working – Method of mechanical manufacture – Assembling or joining

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29580, 357 51, B01J 1700

Patent

active

040707482

ABSTRACT:
A semiconductor integrated circuit which is reduced in size by having active and/or passive elements in an epitaxial layer having a [100] crystallographic surface, and having anisotropically etched regions with sloped [111] crystallographic surface walls which isolate adjacent semiconductor elements and/or regions of semiconductor material beneath said elements. Conductors interconnecting said elements are supported on the [100] and [111] crystallographic surfaces and contact said elements and/or said high conductivity regions through apertures in surface passivating protective coatings on said surfaces.

REFERENCES:
patent: 3623218 (1971-11-01), Mitarai
patent: 3768150 (1973-10-01), Sloan

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