Active solid-state devices (e.g. – transistors – solid-state diode – With shielding
Patent
1996-07-24
1997-11-18
Brown, Peter Toby
Active solid-state devices (e.g., transistors, solid-state diode
With shielding
257758, 257786, H01L 23522, H01L 23552
Patent
active
056891342
ABSTRACT:
An integrated circuit structure is described having a non-metallic electrically conductive plate preferably placed over an insulating layer formed over the uppermost layer of metal lines. The electrically conductive non-metallic plate is operative to terminate electric field lines emanating from at least some of the metal lines in the metal layers under the insulating layer beneath the non-metallic electrically conductive plate, particularly the uppermost metal lines, i.e., those spaced the farthest distance from the underlying semiconductor substrate. The conductive plate may be connected to either a ground line or a power line. In another embodiment, the non-metallic electrically conductive plate may be located between at least the uppermost layer of metal lines and one or more lower layers of metal lines, with insulating layers separating the non-metallic electrically conductive plate from such metal lines.
REFERENCES:
patent: 4622576 (1986-11-01), Buynoski
patent: 4958222 (1990-09-01), Takakura et al.
patent: 4984200 (1991-01-01), Saitoo et al.
patent: 5060045 (1991-10-01), Onada et al.
patent: 5262353 (1993-11-01), Sun et al.
patent: 5300814 (1994-04-01), Matsumoto et al.
patent: 5428242 (1995-06-01), Furuya et al.
Butkus Aldona M.
Pasch Nicholas F.
Brown Peter Toby
LSI Logic Corporation
Taylor John P.
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