Integrated circuit structure

Electricity: conductors and insulators – Conduits – cables or conductors – Preformed panel circuit arrangement

Reexamination Certificate

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Details

C174S255000

Reexamination Certificate

active

06720502

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Technical Field
The present invention relates generally to electronic packaging, and more particularly, to an organic semiconductor chip carrier and method of forming the same.
2. Related Art
As the demand grows in the industry for miniaturized high performance semiconductor packages, the need to manufacture a reliable device having high density connections becomes increasingly important. In other words, producing a device having the largest number of chip connections over the smallest possible area is one of the primary objectives. It is also important to produce a structure capable of providing adequate “wireout” capabilities to take advantage of the high density connections.
FIG. 1
shows a cross-sectional view of a related art semiconductor chip carrier
10
. The carrier
10
includes a ground plane
12
, a first dielectric layer
14
on each side of the ground plane
12
, a signal layer
16
over each first dielectric layer
14
, a second dielectric layer
18
over each signal layer
16
, a power core
20
over each second dielectric layer
18
, and a third dielectric layer
22
over each power core
20
. The carrier
10
has a plurality of copper plated through holes
24
, wherein the copper plating forms a “dogbone” connection pad
28
on the surface of the carrier
10
. A redistribution layer
30
covers the surface of the carrier
10
. The redistribution layer
30
contains contact areas
34
, which facilitate electrical connection of semiconductor chips (not shown), through interconnections (also not shown), to the dogbone connection pads
28
of the plated through holes
24
.
FIG. 2
shows a top view of the related art semiconductor chip carrier
10
. The dogbone connection pads
28
consume a large portion of the surface area on the carrier
10
. This is because the interconnection contact area
34
, the area upon which the interconnection is mounted, is offset from the plated through hole
24
. As a result, the density of plated through holes
24
and interconnections for each carrier
10
is limited.
Additionally, due to differences in the coefficient of thermal expansion between the chip carrier, the chips and the interconnections therebetween, internal stresses develop within the semiconductor package during thermal cycling, which may eventually lead to device failure.
As a result, there exists a need in the industry for a more reliable, compact semiconductor device.
SUMMARY OF THE INVENTION
The present invention provides a more reliable semiconductor chip carrier, having high density plated through hole spacing and chip connections, and a method of forming the same.
The first general aspect of the present invention provides an interconnect structure comprising: a substrate; a plated through hole positioned within the substrate; a redistribution layer on a first and a second surface of the substrate; and a via within the redistribution layer, selectively positioned over and electrically connecting the plated through hole. This aspect allows for a semiconductor chip carrier having an increased plated through hole and chip connection density. This aspect provides vias, containing chip connection pads therein, positioned directly over the plated through holes, which eliminate the conventional dogbone construction. This aspect also provides additional wireout capabilities to take advantage of the increased plated through hole and chip connection density, namely, an additional pair of signal planes and an additional pair of power planes. This aspect also provides a redistribution layer which is made fatigue resistant due to the material choice, as well as locating the second pair of power planes directly underneath the redistribution layer. Due to the roughened surface of the second pair of power planes, the adhesion strength of the redistribution layer to the underlying substrate is increased. In addition, the second pair of power planes act as a redundant layer, preventing cracks originating within the redistribution layer from propagating through the carrier. Furthermore, this aspect provides for direct via connections, which eliminate the need for plated through holes.
A second general aspect of the present invention provides a method of forming a semiconductor chip carrier, comprising the steps of: providing a substrate, having a plated through hole therein; depositing a redistribution layer on a first and a second surface of the substrate; and forming a via within the redistribution layer, selectively positioned over and electrically contacting the plated through hole. This aspect provides a method of forming a semiconductor chip carrier having similar advantages as those associated with the first aspect.
A third general aspect of the present invention provides a semiconductor chip carrier comprising: a substrate having a plated through hole therein; and a fatigue resistant redistribution layer on a first and second surface of the substrate. This aspect provides similar advantages as those associated with the first aspect.
The foregoing and other features of the invention will be apparent from the following more particular description of the embodiments of the invention.


REFERENCES:
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“High Performance Carrier Technology: Materials And Fabrication”, by Light et al, 1993 International Electronics Packaging Conference, San Diego, California, vol. one.
“High Performance Carrier Technology”, by Heck et al, 1993 International Electronics Packaging Conference, San Diego, California, vol. one.
“Process Considerations in the Fabrication of Teflon Printed Circuit Boards”, by Light et al, 1994 Proceedings, 44 Electronic Components & Technology Conference, 5/94.

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