Integrated circuit pattern lithography method capable of reducin

Details Integrated circuit pattern lithography method capable of reducin Integrated circuit pattern lithography method capable of reducin

1998-03-13

1999-10-19

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 5, G03F 900

Patent

active

059686928

ABSTRACT:
An integrated circuit pattern lithography system comprises a repeat unit candidate generating section of extracting a repeat pattern area and further extracting pattern data and array data of a minimum unit of repeated patterns in the repeat pattern area, for generating repeat unit candidates formed by the array of a plurality of the minimum repeat units, a repeat unit deciding section for deciding a repeat unit to be arrayed in the whole repeat pattern area, from the generated repeat unit candidate group, and a cell projection mask manufacturing section for manufacturing a cell projection mask for use in partial batch exposure in the repeat pattern area, correspondingly to the decided repeat unit.

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