Integrated circuit metal-oxide-metal capacitor and method of mak

Details Integrated circuit metal-oxide-metal capacitor and method of mak Integrated circuit metal-oxide-metal capacitor and method of mak

1993-08-24

1995-12-26

Evans, Geoffrey S.

Electricity: electrical systems and devices

Electrostatic capacitors

Fixed capacitor

361303, 361313, 257532, 257535, 29 2542, H01G 433

Patent

active

054793165

ABSTRACT:
An integrated circuit metal-oxide-metal capacitor and method of making it which involves a support layer; a first conductive electrode on the support layer; a dielectric film on the first conductive electrode; a second conductive electrode disposed on the dielectric film and formed from the first level metallization interconnect layer of the integrated circuit; an interlevel dielectric layer; a first contact via extending through the interlevel dielectric layer and the dielectric film to the first conductive electrode; a second contact via extending through the interlevel dielectric layer to the second conductive electrode; and first and second terminals formed from the second level metallization interconnect layer of the integrated circuit contacting the first and second vias, respectively.

REFERENCES:
patent: 3518498 (1970-06-01), Early
patent: 3864817 (1975-02-01), Lapham, Jr. et al.
patent: 4638400 (1987-01-01), Brown et al.
patent: 4731696 (1988-03-01), Himes et al.
patent: 4785202 (1988-11-01), Toyoda
patent: 4831431 (1989-05-01), Hanlon
patent: 4937649 (1990-06-01), Shiba et al.
patent: 4959705 (1990-09-01), Lemnios et al.
patent: 5053917 (1991-10-01), Miyasaka et al.
patent: 5086370 (1992-02-01), Yasaitis
patent: 5369313 (1994-11-01), Yoshihara

Affiliated with

Also associated with

Rating

Integrated circuit metal-oxide-metal capacitor and method of mak does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated circuit metal-oxide-metal capacitor and method of mak, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated circuit metal-oxide-metal capacitor and method of mak will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1373337