Integrated circuit interconnection technique

Electricity: conductors and insulators – Conduits – cables or conductors – Combined

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Details

29832, 174 94R, 174260, 439 66, H01R 909

Patent

active

051626136

ABSTRACT:
Interconnection of each of a plurality of bond sites (14) on a semiconductor chip (10) to a corresponding one of a plurality of metallized areas (16) on a substrate (12) is accomplished via a sheet of anisotropically conductive material (18) sandwiched therebetween. The anisotropically conductive material advantageously has a cutout (24) therein located to expose at least a portion of the substrate lying between a pair of metallized areas (16). The cutout (24) serves to confine a quantity of adhesive (26) deposited therein which serves to secure the chip to the substrate without any physical bond between the metallized areas and the bond sites on the chip while maintaining the anisotropically conductive material in compression.

REFERENCES:
patent: 4113981 (1978-09-01), Fujita et al.
patent: 4433887 (1984-02-01), Sado et al.
patent: 4548862 (1985-10-01), Hartman
patent: 4554033 (1985-11-01), Dery et al.
patent: 4588456 (1986-05-01), Dery et al.
patent: 4640981 (1987-02-01), Dery et al.
patent: 4642421 (1987-02-01), Dery et al.
patent: 4659872 (1987-04-01), Dery et al.
patent: 4729809 (1988-03-01), Dery et al.
patent: 4731282 (1988-03-01), Tsukagoshi et al.
patent: 4735847 (1988-04-01), Fujiwara et al.
patent: 4737112 (1988-04-01), Jin et al.
patent: 4740657 (1988-04-01), Tsukagoshi et al.
patent: 4808112 (1989-02-01), Wood et al.
patent: 4814040 (1989-03-01), Ozawa
patent: 4818607 (1989-04-01), Rickborn et al.
patent: 4820376 (1989-04-01), Lambert et al.
patent: 4864471 (1989-09-01), Hargasser et al.
patent: 5019944 (1991-05-01), Ishii et al.
patent: 5046953 (1991-09-01), Shreeve et al.
patent: 5049085 (1991-09-01), Reylek et al.

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