Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Patent
1997-01-30
2000-06-06
Pham, Hoa Q.
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
3562375, 356394, 250310, G01N 2100
Patent
active
060725745
ABSTRACT:
The present invention relates to circuit defect detection, classification, and review in the wafer stage of the integrated circuit semiconductor device manufacturing process. The method of processing integrated circuit semiconductor dice on a wafer in a manufacturing process for dice comprising the steps of visually inspecting said dice on said wafer to determine defects thereon, summarizing the number, types, and ranges of sizes of the defects of said dice on said wafer, and determining if said wafer is acceptable to proceed in said manufacturing process.
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Micro)n Technology, Inc.
Pham Hoa Q.
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