Integrated circuit arrangement

Details Integrated circuit arrangement Integrated circuit arrangement

1988-04-29

1991-01-08

Sikes, William L.

357 51, H01L 2990

Patent

active

049840312

ABSTRACT:
In an integrated circuit arrangement with a protective arrangement at least partially integrated into it and protecting the integrated circuit arrangement from high-energy electrical faults, the protective arrangement has an ohmic resistance in the form of one or more resistance areas that is designed so as to absorb a major proportion of the energy from electrical faults in the event of limit loads and distribute the heat generated within it by the energy absorption over a surface of the protective arrangement such that the protective arrangement affected by the heat energy of the ohmic resistance is not thermally overloaded. Furthermore, the protective arrangement has a voltage-limiting element or several voltage-limiting elements to limit the interference voltage.

REFERENCES:
patent: 3562547 (1971-02-01), Brode et al.
patent: 3590340 (1971-06-01), Kubo et al.
patent: 3619725 (1971-11-01), Soden et al.
patent: 4135295 (1979-01-01), Price
patent: 4491860 (1985-01-01), Lim
patent: 4507756 (1985-03-01), McElroy
patent: 4667216 (1987-05-01), Bigall et al.
T. H. Baker, L. E. Freed, C. L. Kaufman & D. Tuman, "Three-Layered Underpass Resistor Structure", vol. 14, No. 10, Mar. 1972, p. 2902.
R. Levi, "Reactive Ion Etch Technique for Reducing Series Resistance in Large-Scale Integrated Devices", vol. 20, No. 8, Jan. 1978, pp. 3127 & 3128.

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