Integrated circuit and method

Metal working – Method of mechanical manufacture – Assembling or joining

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Details

29578, 29580, 29589, 357 49, B01J 1700

Patent

active

040373061

ABSTRACT:
An integrated circuit structure is provided in which component isolation is achieved after all diffused junction formation is complete. An anisotropically etched moat provides isolation. The surfaces of the moat are lined with oxide and a planar wafer surface is restored by filling the moat with metal. The subsurface metal region can then be used as a conductor for component interconnection.

REFERENCES:
patent: 3046176 (1962-07-01), Bosenberg
patent: 3575740 (1971-04-01), Castrucci
patent: 3780426 (1973-12-01), Ono
patent: 3883948 (1975-05-01), Allison
patent: 3911562 (1975-10-01), Youmans
patent: 3912556 (1975-10-01), Grenon

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