Integrated bipolar transistor and field effect transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Schottky barrier – As active junction in bipolar transistor

Reexamination Certificate

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C257S197000, C257S370000, C257S378000, C257S539000, C257S552000, C257S565000, C257SE29030, C257SE29033, C257SE29034, C257SE29044, C257SE29171, C257SE29182, C257SE27015, C257SE27109, C438S235000

Reexamination Certificate

active

07656002

ABSTRACT:
The present invention relates to a microelectronic device having a bipolar epitaxial structure that provides at least one bipolar transistor element formed over at least one field effect transistor (FET) epitaxial structure that provides at least one FET element. The epitaxial structures are separated with at least one separation layer. Additional embodiments of the present invention may use different epitaxial layers, epitaxial sub-layers, metallization layers, isolation layers, layer materials, doping materials, isolation materials, implant materials, or any combination thereof.

REFERENCES:
patent: 5250826 (1993-10-01), Chang et al.
patent: 5391257 (1995-02-01), Sullivan et al.
patent: 6906359 (2005-06-01), Zampardi et al.
patent: 2005/0070113 (2005-03-01), Hanberg
patent: 2008/0026545 (2008-01-01), Cooke et al.
Itakura, K. et al., “A GaAs Bi-FET Technology for Large Scale Integration,” International Electron Devices Meeting, 1989, IEDM '89 Technical Digest, Dec. 1989, pp. 389-392, IEEE.

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