Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1998-06-15
2000-10-31
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430261, 4302731, G03C 176, G03C 1805
Patent
active
061400068
ABSTRACT:
An integral membrane can be formed in sheet-like photosensitive laminate structures. The process for forming the structure involves coating a first relatively thin photosensitive layer on a substrate or carrier film, then forming a second relatively thicker photosensitive layer (when compared to the first layer) on the first layer. The structure is exposed by directing appropriate actinic radiation against the substrate, film or carrier layer under controlled conditions such that only the first layer is substantially exposed to radiation resulting in polymerization or crosslinking and a substantial reduction in the solubility of the first layer. The relatively thinner less soluble layer then acts as a peelable integral release layer in the photosensitive structure. The thicker second layer can then be imagewise exposed to actinic radiation, and then used conventionally in imaging processes such as sandblasting.
REFERENCES:
patent: 3808751 (1974-05-01), Usui
patent: 4268601 (1981-05-01), Namiki et al.
patent: 4272620 (1981-06-01), Ichimura
patent: 4430416 (1984-02-01), Goto et al.
patent: 4530896 (1985-07-01), Christensen et al.
patent: 4587186 (1986-05-01), Nakamura at al.
patent: 4764449 (1988-08-01), VanIseghem
patent: 4985344 (1991-01-01), Uchino et al.
patent: 5057394 (1991-10-01), Yabe et al.
patent: 5158857 (1992-10-01), Shinozaki et al.
patent: 5260173 (1993-11-01), Birkholm
patent: 5415971 (1995-05-01), Couture et al.
patent: 5427890 (1995-06-01), Suzuki et al.
patent: 5518857 (1996-05-01), Suzuki et al.
patent: 5629132 (1997-05-01), Suzuki et al.
Aicello Photo Masking (APM) Film Product Brochure.
Gybin Alexander S.
Johnson Kyle
Komatsu Toshifumi
MacLean Dylan E.
Baxter Janet
Clarke Yvette M.
The Chromaline Corporation
LandOfFree
Integral membrane layer formed from a photosensitive layer in an does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Integral membrane layer formed from a photosensitive layer in an, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integral membrane layer formed from a photosensitive layer in an will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2049393