Insulation film-forming method for semiconductor device manufact

Details Insulation film-forming method for semiconductor device manufact Insulation film-forming method for semiconductor device manufact

1995-05-26

1998-09-08

Nguyen, Tuan H.

Fishing, trapping, and vermin destroying

437 41, 437238, 437978, H01L 21316

Patent

active

058044540

ABSTRACT:
An insulation film-forming method comprising the steps of:

REFERENCES:
patent: 3926508 (1975-12-01), Harmsen et al.
patent: 3991234 (1976-11-01), Chang et al.
patent: 4052520 (1977-10-01), Chang et al.
patent: 4061800 (1977-12-01), Anderson
patent: 4624859 (1986-11-01), Akira et al.
patent: 5085904 (1992-02-01), Deak et al.
patent: 5302208 (1994-04-01), Grimm et al.
Wolf, Stanley "Silicon Processing for the VLSI Era", vol. 2, pp. 188-199.

Affiliated with

Also associated with

Rating

Insulation film-forming method for semiconductor device manufact does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Insulation film-forming method for semiconductor device manufact, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Insulation film-forming method for semiconductor device manufact will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1281383