Insulating film material containing an organic silane...

Details Insulating film material containing an organic silane... Insulating film material containing an organic silane...

2007-01-09

2007-01-09

Moore, Margaret G. (Department: 1712)

Stock material or miscellaneous articles

Composite

Of silicon containing

C427S249150, C556S482000

Reexamination Certificate

active

10354052

ABSTRACT:
An insulating film material formed by chemical vapor deposition, which contains an organic silane compound having such a structure that at least one secondary hydrocarbon group and/or tertiary hydrocarbon group is directly bonded to a silicon atom.

REFERENCES:
patent: 4711820 (1987-12-01), Arkles et al.
patent: 5061514 (1991-10-01), Boeglin
patent: 6303047 (2001-10-01), Aronowitz et al.
patent: 6583048 (2003-06-01), Vincent et al.
patent: 0 826 791 (1998-03-01), None
patent: 2000-302791 (2000-10-01), None

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