Insulating-film forming composition, insulating film and...

Details Insulating-film forming composition, insulating film and... Insulating-film forming composition, insulating film and...

2006-09-19

2009-12-01

Zimmer, Marc S (Department: 1796)

Stock material or miscellaneous articles

Composite

Of silicon containing

C528S015000, C528S025000, C528S031000, C524S315000, C524S317000, C524S356000, C524S366000, C524S379000

Reexamination Certificate

active

07625636

ABSTRACT:
An insulating-film forming composition comprising: at least one of: a dendrimer having a core portion and a branched end; and a polymer of the dendrimer; and a coating solvent, wherein the dendrimer has a cage silsesquioxane at the core portion, and has a polymerizable group at the branched end; an insulating film obtained by using the film forming composition; and an electronic device having the insulating film.

REFERENCES:
patent: 7507783 (2009-03-01), Meador et al.
patent: 2006/0122351 (2006-06-01), Laine et al.
patent: 2002-338693 (2002-11-01), None
patent: 2002-363414 (2002-12-01), None
Article entitled “Synthesis of Highly-Functionalized Dendrimers Based on Polyhedral Silsesquioxane Cores” authored by Jaffrès et al., and piublished in J. Chem. Soc., Dalton Trans., 1998, 2767.
Article entitled “Silsesquioxane Chemistry III. Carbosilane Dendrimers Based on a Cubic Si8O12 Core” authored by Müller et al. and published in Main Group Metal Chemistry (1999), 22(8), 485-488.
Abstract for the article entitled “Synthesis and Characterization of Chloro-, Allyl, and Ferrocenyl-substituted Silsesquioxanes” authored by Mutluay et al. and published in Organosilicon Chemistry IV: From Molecules to Materials (Lectures and Poster Contributions presented at the Muechner Silicontage), 4th, Muechen, (2000), meeting date 1998, 531-5.

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