Insulating boards and method of manufacturing the same

Stock material or miscellaneous articles – Structurally defined web or sheet – Including variation in thickness

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428141, 428156, 428446, 428450, 428469, 428701, 428702, H01L 2100

Patent

active

056724110

ABSTRACT:
An insulating board having a substrate, and an insulating film of silicon oxide formed on the surface of the substrate by vapor phase deposition. In forming the film, the forming conditions are controlled so that the film is formed in an overhang or conformal shape at initial stage and then in a flow shape. Thereby, both good adhesion and excellent insulation properties are achieved.

REFERENCES:
patent: 4371587 (1983-02-01), Peters
patent: 4794048 (1988-12-01), Oboodi
patent: 4900591 (1990-02-01), Bennett et al.
Hatanaka et al., "H.sub.2 O-Teos Plasma-CVD Realizing Dielectrics Having a Smooth Surface", VMIC Conference, Jun. 11-12, 1991, pp. 435-441.

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