Insulated metal substrates and process for the production thereo

Stock material or miscellaneous articles – Structurally defined web or sheet – Including aperture

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

428201, 428210, B32B 300

Patent

active

051126680

ABSTRACT:
The disclosure relates to insulated metal substrates and to a process for producing these substrates. These substrates have an aluminium base, an insulant constituted by an alumina film obtained by anodizing at least one of the faces of said base and at least one metal film which is to be transformed by chemical etching into a network of conductors. The alumina film is formed by a uniform compact zone adhering to the aluminium and having a thickness in excess of 500 nm and a porous layer with a rough outer surface. The process of making these substrates includes a step during which at least one of the faces of the aluminium base undergoes a treatment in a porous anodization layer forming bath and then in a barrier anodization layer forming bath. The invention is used in the production of substrates for single face, double face, with metallized holes, and multilayer conductive circuits. The substrates produced have a planar or non-planar configuration, and may also have resistive networks.

REFERENCES:
patent: 2578400 (1951-12-01), Cohn
patent: 3385732 (1968-05-01), Curran

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Insulated metal substrates and process for the production thereo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Insulated metal substrates and process for the production thereo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Insulated metal substrates and process for the production thereo will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2425885

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.