Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor
Patent
1995-03-31
1997-09-09
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Regenerative type switching device
Combined with field effect transistor
257136, 257152, 257154, 257162, H01L 2974, H01L 31111
Patent
active
056659873
ABSTRACT:
In a gate insulated static induction thyristor with a split gate type shorted cathode structure, a first gate of the split gate structure is used as a cathode short-circuit gate and the cathode region is formed in the second gate. A MOS structure is formed on the second gate as a control gate electrode isolated therefrom. Since the channel integration density is high, the area efficiency increases. The MOS gate structure suppresses the minority carrier (hole) storage effect to permit high-speed swtching of the thyristor, and the shorted cathode structure provides for increased maximum controllable current/voltage durability. The split gate structure can be used in combination with planar, buried, recessed and double gate structures.
REFERENCES:
patent: 5198687 (1993-03-01), Baliga
Switching Characteristics of an IEE of Japan, Oct. 26, 1990 SI Thyristor With a Shorted Structure.
Higuchi Toshio
Iguchi Makoto
Muraoka Kimihiro
Ohtsubo Yoshinobu
Tamamushi Takashige
Ngo Ngan V.
Tamamushi Takashige
Toyo Denki Seizo Kabushiki Kaisha
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