Insulated gate semiconductor device and method of manufacture

Fishing – trapping – and vermin destroying

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437 41, 437 44, H01L 21265

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active

055411320

ABSTRACT:
An insulated gate field effect transistor (10) having an reduced gate to drain capacitance and a method of manufacturing the field effect transistor (10). A dopant well (13) is formed in a semiconductor material (11). A gate oxide layer (26) is formed on the dopant well (13) wherein the gate oxide layer (26) and a gate structure (41) having a gate contact portion (43) and a gate extension portion (44). The gate contact portion (43) permits electrical contact to the gate structure (41), whereas the gate extension portion (44) serves as the active gate portion. A portion of the gate oxide (26) adjacent the gate contact portion (43) is thickened to lower a gate to drain capacitance of the field effect transistor (10) and thereby increase a bandwidth of the insulated gate field effect transistor (10).

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patent: 4968639 (1990-11-01), Bergonzoni
patent: 5170232 (1992-12-01), Narita
patent: 5202277 (1993-04-01), Kameyama et al.
patent: 5372960 (1994-12-01), Davies et al.
patent: 5413949 (1995-05-01), Hong
patent: 5427964 (1995-06-01), Kaneshiro et al.

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