Insulated gate bipolar transistor and method for...

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

Reexamination Certificate

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C257S147000, C257S152000, C257SE21382, C438S135000, C438S141000

Reexamination Certificate

active

07999285

ABSTRACT:
An insulated gate bipolar transistor according to an embodiment includes a first conductive type collector ion implantation area in a substrate; a second conductive type buffer layer, including a first segment buffer layer and a second segment buffer layer, on the first conductive collector ion implantation area; a first conductive type base area on the second conductive type buffer layer; a gate on the substrate at a side of the first conductive type base area; a second conductive type emitter ion implantation area in the first conductive type base area; an insulating layer on the gate; an emitter electrode electrically connected to the second conductive type emitter ion implantation area; and a collector electrode electrically connected to the first conductive collector ion implantation area. The first segment buffer layer can be aligned below a portion of the base area and can have a lower density of second conductive type ions than that of the second segment buffer layer adjacent the first segment buffer layer.

REFERENCES:
patent: 5014101 (1991-05-01), Finney
patent: 5728593 (1998-03-01), Yun et al.
patent: 5838027 (1998-11-01), Kim et al.
patent: 5891776 (1999-04-01), Han et al.
patent: 6222248 (2001-04-01), Fragapane
patent: 1374703 (2002-10-01), None
patent: 10-290011 (1998-10-01), None
patent: 10-0163875 (1998-12-01), None

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