Insulated gate bipolar transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

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Details

257140, 257142, H01L 29740, H01L 29747

Patent

active

053269934

ABSTRACT:
An insulated gate bipolar transistor employs a semiconductor substrate constructed by putting a high impurity density area, a low impurity density and a conductivity modulation area, respectively, of an n type on one another sequentially on a substrate of a p type, serving as a drain area. A gate is disposed on a gate oxide film deposited on the conductivity modulation area. A channel forming layer of a p type and a source layer of an n type are diffused from windows of the gate in such a manner that the peripheral edges of these layers creep under the gate, and a drain terminal, a source terminal, and on/off controlling gate terminal extend from the drain area, the channel forming layer and source layer, and the gate, respectively.

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