Electricity: electrical systems and devices – Electric charging of objects or materials – Particulate matter
Patent
1980-10-20
1982-06-15
Schroeder, L. C.
Electricity: electrical systems and devices
Electric charging of objects or materials
Particulate matter
239691, B05B 502
Patent
active
043354190
ABSTRACT:
An apparatus is provided for producing a spray of atomized and electrostatically charged particles of liquid to remove oppositely charged pollutants from the atmosphere. The apparatus is particularly suited for use in a potentially explosive atmosphere. The apparatus includes a nozzle which receives liquid and compressed air and produces a high pressure spray of atomized liquid particles. A ring electrode coaxially surrounds the spray near the nozzle. The electrode is chargeable to a high electrostatic potential relative to the nozzle, whereby the liquid particles of the spray are inductively charged by passing the ring. The electrode is fully encased in a ring of insulating material. A grounded metal housing surrounds the ring of insulating material on all sides except the radially interior side thereof. The metal housing and ring of insulating material are coated on all exposed surfaces by a dip coating of insulating material.
REFERENCES:
patent: 2302185 (1942-11-01), Campbell
patent: 3698635 (1972-10-01), Sickles
patent: 4004733 (1977-01-01), Law
patent: 4009829 (1977-03-01), Sickles
patent: 4120017 (1978-10-01), Sickles
patent: 4186886 (1980-02-01), Sickles
patent: 4190875 (1980-02-01), Smart et al.
patent: 4219864 (1980-08-01), Grunenfelder et al.
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