Installation for treatment of materials for the production of se

Details Installation for treatment of materials for the production of se Installation for treatment of materials for the production of se

1983-11-02

1985-02-12

Smith, John D.

Coating apparatus

Gas or vapor deposition

Multizone chamber

118 50, 118729, 118733, 118500, 414217, 414222, 414287, C23C 1308

Patent

active

044984162

ABSTRACT:
Installation for treatment of materials for semi-conductors, starting from slices (30) gathered onto carriers (5) and treated in a series of vacuum chambers. The installation is in modular form, each module (A, B, C, D) including a straight tubular portion (1, 2, 3, 4) which forms with the adjacent modules a continuous tunnel for straight flow of the carriers (5). The carriers are driven and the slices are individually manipulated between the carriers and the treatment apparatus. The invention is applicable to treatment by epitaxis by molecular jets.

REFERENCES:
patent: 3404661 (1968-10-01), Mathias et al.
patent: 4047624 (1977-09-01), Dorenbos
patent: 4412771 (1983-11-01), Gerlach et al.
patent: 4433951 (1984-02-01), Koch et al.

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