Installation for processing wafers

Details Installation for processing wafers Installation for processing wafers

2005-05-03

2005-05-03

Phasge, Arun S. (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C134S061000, C134S084000, C134S902000, C700S225000, C700S228000, C414S940000, C156S345120, C156S345240

Reexamination Certificate

active

06887358

ABSTRACT:
An installation for processing wafers with a plurality of fabrication units and a plurality of measurement units as well as a transport system for transporting the wafers, is described. A transport control unit, which detects a capacity utilization of the installation and saves a processing sequence of the wafers, is allocated to the transport system. As a function of these parameters, control instructions are generated in the transport control unit, and can be output to the transport system for controlling the wafer transport procedure.

REFERENCES:
patent: 4672185 (1987-06-01), Sato et al.
patent: 5432702 (1995-07-01), Barnett
patent: 5855681 (1999-01-01), Maydan et al.
patent: 5855726 (1999-01-01), Soraoka et al.
patent: 6594546 (2003-07-01), Elger
patent: 6623231 (2003-09-01), Elger
patent: 197 45 386 (1998-08-01), None
patent: 06 286 824 (1994-10-01), None
patent: 11 260 883 (1999-09-01), None

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