Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-06-19
2010-11-02
Toatley, Jr., Gregory J (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400
Reexamination Certificate
active
07826049
ABSTRACT:
An inspection system can support operation in multiple states. For instance, when inspecting an article, such as a semiconductor wafer, the tool can switch between imaging multiple locations using respective detectors to another operating state wherein multiple detectors operating in multiple imaging modes inspect a single location. An inspection system may combine the use of multiple detectors for multiple locations and the use of multiple viewing angles or modes for the same locations and thereby achieve high throughput. The different imaging modes can comprise, for example, different collection angles, polarizations, different spectral bands, different attenuations, different focal positions relative to the wafer, and other different types of imaging.
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Applied Materials South East Asia PTE. LTD.; PCT/IL2009/000572 Filed Jun. 9, 2009; International Search Report and Written Opinion; ISA/EP; mailed Sep. 16, 2009; 16 pp.
Furman Dov
Silberstein Shai
Tirosh Ehud
Applied Materials South East Asia Pte. Ltd.
Merlino Amanda H
Sonnenschein Nath & Rosenthal LLP
Toatley Jr. Gregory J
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