Image analysis – Applications – Manufacturing or product inspection
Patent
1998-02-24
2000-07-18
Boudreau, H.
Image analysis
Applications
Manufacturing or product inspection
438 16, 716 21, G06K 982
Patent
active
060918454
ABSTRACT:
An improved technique for inspecting photomasks employs simulated images of the resist pattern. A simulated image of an original pattern is compared to a simulated image generated from a pattern captured from a photomask manufactured from the original pattern. Alternatively, simulated images generated from captured data from two different instances of the same original pattern formed in a photomask are compared.
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Burdorf James
Pierrat Christophe
Boudreau H.
Micro)n Technology, Inc.
Werner Brian P.
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