Inspection system for pellicalized reticles

Details Inspection system for pellicalized reticles Inspection system for pellicalized reticles

1985-10-31

1987-01-20

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Methods

355 53, G03B 2732

Patent

active

046377140

ABSTRACT:
A method of detecting defects in a reticle used to fabricate semiconductor circuits by enhancing the image of a defect in one chip site without appreciably changing all other chip site images. In a step-and-repeat alignment system, a first chip site is exposed under normal intensities to print the reticle pattern at a proper exposure level. At a second chip site, exposure takes place using the same reticle (or a second identical reticle) at lower intensity levels. Given this underexposure, residual photoresist will remain at defect sites. The optical imagery at the two chip sites is different allowing comparator techniques to be used.

REFERENCES:
patent: 3819265 (1974-06-01), Feldman et al.
patent: 4131363 (1978-12-01), Shea et al.
patent: 4239384 (1980-12-01), Treiber
patent: 4335956 (1982-06-01), Findeis et al.
patent: 4416539 (1983-11-01), Tereshita
patent: 4443096 (1984-04-01), Johannsmeier et al.
patent: 4577961 (1986-03-01), Tereshita

Affiliated with

Also associated with

Rating

Inspection system for pellicalized reticles does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inspection system for pellicalized reticles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection system for pellicalized reticles will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2132384