Inspection system and a method for inspecting a...

Details Inspection system and a method for inspecting a... Inspection system and a method for inspecting a...

2007-09-11

2007-09-11

Punnoose, Roy M. (Department: 2886)

Optics: measuring and testing

Position or displacement

C356S620000, C356S237200

Reexamination Certificate

active

11052698

ABSTRACT:
An inspection system for inspecting a wafer and an inspection method thereof are provided. The inspection system includes a rotating means for turning and arranging a wafer to an inspection position, an angle measuring means for measuring a rotational angle used by the rotating means to rotate to the inspection position, an inspection apparatus for acquiring inspection data associated with the wafer, and a controller for determining an amending angle from the rotational angle and for amending the inspection data in accordance with the amending angle to calculate amended inspection data, wherein the amended inspection data reflects a state of the wafer on the rotating means.

REFERENCES:
patent: 4833790 (1989-05-01), Spencer et al.
patent: 5102280 (1992-04-01), Poduje et al.
patent: 5483138 (1996-01-01), Shmookler et al.
patent: 5690744 (1997-11-01), Landau
patent: 5742393 (1998-04-01), Landau et al.
patent: 6120601 (2000-09-01), Landau et al.
patent: 6195619 (2001-02-01), Ren
patent: 10-288517 (1998-10-01), None
patent: 11-003930 (1999-01-01), None

Affiliated with

Also associated with

Rating

Inspection system and a method for inspecting a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inspection system and a method for inspecting a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection system and a method for inspecting a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3742172