Inspection method and apparatus, lithographic apparatus,...

Optics: measuring and testing – Of light reflection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S243100, C355S055000, C702S027000, C702S159000

Reexamination Certificate

active

07460237

ABSTRACT:
In a method of determining a structure parameter of a target pattern in a lithographic process, a series of calibration spectra are calculated from a reference pattern. Spectral analysis is performed on each calculated spectra, the spectral components and associated weighting being derived and stored in a library or used as the basis of an iterative search method. A spectrum is measured from the target pattern and spectral analysis of the measured spectrum is performed. The derived weighting factors of the principal components are compared with the weighting factors of the measured spectrum to determine the structure parameter.

REFERENCES:
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5880838 (1999-03-01), Marx et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6608690 (2003-08-01), Niu et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6738138 (2004-05-01), Wei
patent: 6753961 (2004-06-01), Norton et al.
patent: 6768983 (2004-07-01), Jakatdar et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6795193 (2004-09-01), Schulz
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6856408 (2005-02-01), Raymond
patent: 6919964 (2005-07-01), Chu
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6972852 (2005-12-01), Opsal et al.
patent: 6974962 (2005-12-01), Brill et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061623 (2006-06-01), Davidson
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7068363 (2006-06-01), Bevis et al.
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2005/0185174 (2005-08-01), Laan et al.
patent: 2006/0033921 (2006-02-01), Den Boef et al.
patent: 2006/0066855 (2006-03-01), Den Boef et al.
patent: 2006/0126074 (2006-06-01), Van Der Werf et al.
patent: 2006/0139592 (2006-06-01), Den Boef et al.
patent: 2007/0222979 (2007-09-01), Van Der Laan et al.
patent: 2008/0088832 (2008-04-01), Cramer et al.
patent: WO 2005/081069 (2005-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Inspection method and apparatus, lithographic apparatus,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inspection method and apparatus, lithographic apparatus,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection method and apparatus, lithographic apparatus,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4051112

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.