Inspection method and apparatus, lithographic apparatus,...

Optics: measuring and testing – Lens or reflective image former testing

Reexamination Certificate

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C356S125000, C356S601000, C356S625000, C356S636000, C430S022000, C430S030000

Reexamination Certificate

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07916284

ABSTRACT:
In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component analysis is applied to the difference spectra to obtain a calibration function that is less sensitive to variations in the underlying structure than a calibration function obtained from spectra obtained from a single target.

REFERENCES:
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5880838 (1999-03-01), Marx et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6608690 (2003-08-01), Niu et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6738138 (2004-05-01), Wei
patent: 6753961 (2004-06-01), Norton et al.
patent: 6768983 (2004-07-01), Jakatdar et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6856408 (2005-02-01), Raymond
patent: 6919964 (2005-07-01), Chu
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6972852 (2005-12-01), Opsal et al.
patent: 6974962 (2005-12-01), Brill et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061623 (2006-06-01), Davidson
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7068363 (2006-06-01), Bevis et al.
patent: 7352453 (2008-04-01), Mieher et al.
patent: 2003/0104292 (2003-06-01), Tomimatu
patent: 2004/0070771 (2004-04-01), Ausschnitt
patent: 2004/0114132 (2004-06-01), Den Boef et al.
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2004/0190008 (2004-09-01), Mieher et al.
patent: 2005/0106479 (2005-05-01), Geh et al.
patent: 2005/0185174 (2005-08-01), Laan et al.
patent: 2006/0033921 (2006-02-01), Den Boef et al.
patent: 2006/0066855 (2006-03-01), Den Boef et al.
patent: 2006/0126074 (2006-06-01), Van Der Werf et al.
patent: 2006/0139592 (2006-06-01), Den Boef et al.
patent: 2007/0003840 (2007-01-01), Van Der Schaar et al.
patent: 1 628 164 (2006-02-01), None
patent: 7-326563 (1995-12-01), None
patent: 8-264409 (1996-10-01), None
patent: 10-154647 (1998-06-01), None
patent: 2003-168641 (2003-06-01), None
patent: 2006-040951 (2006-02-01), None
patent: WO 2005/081069 (2005-09-01), None
Written Opinion and Search Report for Singapore Application No. SG 200704170-0 mailed Sep. 26, 2008, 7 pgs.
Notice of Reasons for Rejection mailed Aug. 26, 2010 for Japanese Patent Application No. 2007-181810, 3 pgs.

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