Inspection method and apparatus, lithographic apparatus,...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C382S209000

Reexamination Certificate

active

07916927

ABSTRACT:
Building of a model profile for a target is disclosed. An embodiment of the method includes importing an image of a known object and superimposing, on this image, either by hand or automatically, an estimated profile. The estimated profile is defined mathematically and adjusted segment by segment in order to match the image such that the adjusted estimated profile may be stored alongside a diffraction spectrum associated with the image. Alternatively or additionally, a user may trace (or free-draw) the profile of a known image and subsequently map a shape-definer of a mathematical function such as a polynomial equation, a spline or a vector onto the estimated profile in order to obtain a profile and one or more variables of that profile that may be used to reconstruct the profile of an unknown object from its diffraction pattern.

REFERENCES:
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5880838 (1999-03-01), Marx et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6608690 (2003-08-01), Niu et al.
patent: 6650422 (2003-11-01), Singh et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6738138 (2004-05-01), Wei
patent: 6753961 (2004-06-01), Norton et al.
patent: 6768983 (2004-07-01), Jakatdar et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6856408 (2005-02-01), Raymond
patent: 6891626 (2005-05-01), Niu et al.
patent: 6919964 (2005-07-01), Chu
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6972852 (2005-12-01), Opsal et al.
patent: 6974962 (2005-12-01), Brill et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7046375 (2006-05-01), Bischoff et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061623 (2006-06-01), Davidson
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7068363 (2006-06-01), Bevis et al.
patent: 7092110 (2006-08-01), Balasubramanian et al.
patent: 7281810 (2007-10-01), Lee
patent: 7330279 (2008-02-01), Vuong et al.
patent: 7515282 (2009-04-01), Li et al.
patent: 2003/0028358 (2003-02-01), Niu et al.
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2004/0210402 (2004-10-01), Opsal et al.
patent: 2006/0033921 (2006-02-01), Den Boef et al.
patent: 2006/0066855 (2006-03-01), Den Boef et al.
patent: 2006/0126074 (2006-06-01), Van Der Werf et al.
patent: 2006/0139592 (2006-06-01), Den Boef et al.
patent: 06-117844 (1994-04-01), None
patent: 07-210679 (1995-08-01), None
patent: 2001-084403 (2001-03-01), None
patent: 2005-534192 (2005-11-01), None
English language abstract of Japanese Patent Publication No. JP 06-117844 A, Japanese Patent Office, published Apr. 28, 1994; 1 page.
English language abstract of Japanese Patent Publication No. JP 07-210679 A, Japanese Patent Office, published Aug. 11, 1995; 1 page.
English language abstract of Japanese Patent Publication No. JP 2001-084403 A, Japanese Patent Office, published Mar. 30, 2001; 1 page.
English language abstract of Japanese Patent Publication No. JP 2005-534192 A, Japanese Patent Office, published Nov. 10, 2005; 1 page.
English translation of Japanese Decision of Rejection directed to related Japanese Patent Application No. 2008-002186, mailed Dec. 21, 2010 from the Japan Patent Office; 2 pages.
English translation of Israeli Office Action directed to related Israeli Patent Application No. 188768, mailed Dec. 7, 2010 from the Israeli Patent Office, Israel; 5 pages.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Inspection method and apparatus, lithographic apparatus,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inspection method and apparatus, lithographic apparatus,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection method and apparatus, lithographic apparatus,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2697110

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.